Mitsuhiro Okazawa

Title: Innovations of Mitsuhiro Okazawa

Introduction

Mitsuhiro Okazawa is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of charged particle beam technology, holding a total of five patents. His work has advanced the capabilities of multi-beam writing apparatuses, which are essential in various high-precision applications.

Latest Patents

One of his latest patents is the "Multi charged particle beam writing apparatus." This invention features a blanking aperture array substrate equipped with multiple blankers that perform blanking deflection on several charged particle beams. Additionally, it includes a first shield member made of high magnetic permeability material, which is strategically placed downstream to enhance performance. Another notable patent is the "Multiple-charged particle-beam irradiation apparatus and method." This apparatus utilizes a shaping aperture array substrate to create multi-beams and incorporates a movable table for precise alignment and positioning of the blanking aperture array substrates.

Career Highlights

Mitsuhiro Okazawa is currently employed at Nuflare Technology, Inc., where he continues to innovate in the field of charged particle beam technology. His expertise and inventions have positioned him as a key figure in advancing this technology, contributing to the development of more efficient and effective systems.

Collaborations

Throughout his career, Okazawa has collaborated with notable colleagues, including Hirofumi Morita and Kenichi Kataoka. These collaborations have fostered a creative environment that has led to groundbreaking advancements in their field.

Conclusion

Mitsuhiro Okazawa's contributions to charged particle beam technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in high-precision applications, showcasing the impact of his inventions.