The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2026
Filed:
Sep. 29, 2022
Nuflare Technology, Inc., Yokohama, JP;
Haruyuki Nomura, Yokohama, JP;
Noriaki Nakayamada, Yokohama, JP;
NuFlare Technology, Inc., Yokohama, JP;
Abstract
An amount of charge of a substrate is promptly and accurately calculated. A charged particle beam writing method includes a step for virtually dividing a writing region of the writing target substrate in a mesh-like manner and calculating a pattern density representing an arrangement ratio of the pattern for each mesh region, a step for calculating a dose for each mesh region using the pattern density, a step for calculating a charge amount based on a film thickness of the resist film formed on the substrate and the calculated dose by using a predetermined function for charge amount calculation, the function using, as variables, the film thickness of the resist film and the dose, a step for calculating a position shift amount of a writing position from the calculated charge amount, and a step for correcting an irradiation position of the charged particle beam using the position shift amount.