Company Filing History:
Years Active: 2016-2025
Title: Haruyuki Nomura: Innovator in Charged Particle Beam Technology
Introduction
Haruyuki Nomura is a prominent inventor based in Yokohama, Japan, known for his significant contributions to the field of charged particle beam technology. With a total of 10 patents to his name, Nomura has made remarkable advancements that have implications in various technological applications.
Latest Patents
Nomura's latest patents include a charged particle beam writing method, a charged particle beam writing apparatus, and a computer-readable recording medium. The charged particle beam writing method involves deflecting a charged particle beam to write patterns on a substrate with a resist film. This method includes irradiating a pattern region with a beam at a first dose and a non-pattern region at a second dose, ensuring that the resist film is not dissolved away. The second dose is determined based on the first dose and the charge amount of the resist film, optimizing the writing process. The charged particle beam writing apparatus further enhances this method by maintaining specific temperatures during substrate transfer and calculating correction amounts for charged particle beams to ensure precise pattern writing.
Career Highlights
Nomura is currently employed at Nuflare Technology, Inc., where he continues to innovate and develop advanced technologies in the field. His work has been instrumental in pushing the boundaries of charged particle beam applications, making significant contributions to the industry.
Collaborations
Throughout his career, Nomura has collaborated with notable colleagues, including Noriaki Nakayamada and Takashi Kamikubo. These collaborations have fostered a creative environment that has led to groundbreaking advancements in their field.
Conclusion
Haruyuki Nomura's work in charged particle beam technology exemplifies the spirit of innovation and dedication to advancing scientific knowledge. His patents and contributions continue to influence the industry and inspire future developments in technology.
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