Yokohama, Japan

Rieko Nishimura

This inventor holds 22 USPTO granted patents and 2 published patent applications, primarily in Charged Particle Beam Technology. Top assignee: Nuflare Technology, Inc.. Active years: 2010-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rieko Nishimura. Retrieved from https://idiyas.com/inventor/rieko-nishimura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 22 

% Patents Active = 95.5

Average Co-Inventor Count = 1.6

ph-index = 5

Forward Citations = 54(Granted Patents)


Location History:

  • Kawasaki, JP (2014)
  • Kanagawa, JP (2010 - 2015)
  • Kanagawa-ken, JP (2018 - 2019)
  • Yokohama, JP (2010 - 2024)

Company Filing History:


Years Active: 2010-2024

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Areas of Expertise:
Beam Writing
Lithography System
Beam Deflection
Evaluation Method
Correction Method
Electron Beam
Deflection Aberration
Settling Time
Charged Particle
Multi-Charged Particle
22 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Rieko Nishimura

Introduction

Rieko Nishimura is a prominent inventor based in Yokohama, Japan, known for his significant contributions to the field of charged particle beam technology. Holding a remarkable portfolio of 22 patents, Nishimura has specialized in advancing methods and devices that enhance the precision and efficiency of writing using multi-charged-particle beams.

Latest Patents

Among his latest innovations, Nishimura has developed a multi-charged-particle-beam writing apparatus and method. This invention involves a sophisticated tracking operation whereby a substrate is continuously irradiated with several charged particle beams. The key highlights of this patented technology revolve around the capability to adjust the deflection positions of the beams in real-time, ensuring that multiple rectangular regions of a substrate are accurately written upon. This process is structured in such a way that the precision of individual pixels, which form each rectangular region, is upheld through a unique first and second shot order of irradiation.

Additionally, his patent on the multi-charged particle beam evaluation method showcases his expertise in assessing the performance of written patterns on substrates. By measuring the line widths of various evaluation patterns and analyzing the variations from design expectations, Nishimura's method remarkably contributes to refining the accuracy of charged particle beam applications.

Career Highlights

Rieko Nishimura is currently employed at Nuflare Technology, Inc., where he leverages his expertise in the development of advanced writing technologies. His innovative approach has positioned him as a key player in the industry, driving advancements that benefit various applications within the field of semiconductor manufacturing and material science.

Collaborations

Throughout his career, Nishimura has worked alongside talented colleagues such as Takashi Kamikubo and Shuichi Tamamushi. Their collaborative efforts contribute significantly to ongoing research and development, leading to groundbreaking innovations that continually push the boundaries of what is possible in multi-charged particle technology.

Conclusion

Rieko Nishimura's work exemplifies the spirit of innovation and invention that continues to propel advancements in technology. With a solid foundation of patents and collaborative initiatives, he remains a pivotal figure in the field, contributing to the evolution of writing methods utilizing multi-charged-particle beams. As technology evolves, the implications of Nishimura’s inventions are likely to resonate across various industries, signaling ongoing advancements and new horizons.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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