The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2019

Filed:

Jun. 05, 2018
Applicant:

Nuflare Technology, Inc., Kanagawa, JP;

Inventors:

Satoru Hirose, Yokohama, JP;

Rieko Nishimura, Yokohama, JP;

Ryosuke Ueba, Yokohama, JP;

Assignee:

NUFLARE TECHNOLOGY, INC., Kanagawa, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/302 (2006.01); H01J 37/20 (2006.01); H01J 37/147 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3026 (2013.01); H01J 37/147 (2013.01); H01J 37/20 (2013.01); H01J 37/3174 (2013.01); H01J 37/3177 (2013.01); H01J 2237/30455 (2013.01); H01J 2237/30472 (2013.01); H01J 2237/31774 (2013.01); H01J 2237/31776 (2013.01);
Abstract

A charged particle beam writing apparatus includes a writing data generation circuitry to input character information or information of an item selected, for specifying an apparatus quality check pattern used for evaluating apparatus quality of a charged particle beam writing apparatus, and to generate writing data of the apparatus quality check pattern based on the character information or the information of the item selected, and a combination circuitry to input writing data of an actual chip pattern to be written on a target object, and to combine the writing data of the actual chip pattern and the writing data of the apparatus quality check pattern such that the actual chip pattern and the apparatus quality check pattern do not overlap with each other.


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