Ryosuke Ueba

Title: Innovations of Ryosuke Ueba

Introduction

Ryosuke Ueba is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of charged particle beam technology. With a total of two patents to his name, Ueba's work focuses on advanced writing methods and apparatuses that enhance the precision and efficiency of charged particle beam applications.

Latest Patents

Ueba's latest patents include a "Multi-charged-particle-beam writing apparatus" and a "multi-charged-particle-beam writing method." In one embodiment of the writing method, a tracking operation is performed while a substrate on a continuously moving stage is irradiated with multiple charged particle beams. The deflection positions of these beams follow the movement of the stage, allowing for precise application to a writing area composed of multiple rectangular regions arranged in a mesh. Each rectangular region contains a plurality of pixels, which are irradiated in a specific order to achieve the desired writing effect. His other patent, the "charged particle beam writing apparatus," includes circuitry for generating writing data based on character information and combining it with actual chip pattern data, ensuring that the two do not overlap.

Career Highlights

Ryosuke Ueba is currently employed at Nuflare Technology, Inc., where he continues to innovate in the field of charged particle beam technology. His work has been instrumental in advancing the capabilities of writing apparatuses used in various applications.

Collaborations

Ueba collaborates with talented coworkers, including Satoru Hirose and Rieko Nishimura. Their combined expertise contributes to the innovative projects at Nuflare Technology, Inc.

Conclusion

Ryosuke Ueba's contributions to charged particle beam technology through his patents and work at Nuflare Technology, Inc. highlight his role as a significant inventor in this field. His innovative methods and apparatuses continue to push the boundaries of technology.