The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
Oct. 20, 2017
Applicant:
Nuflare Technology, Inc., Kanagawa, JP;
Inventor:
Rieko Nishimura, Yokohama, JP;
Assignee:
NUFLARE TECHNOLOGY, INC., Kanagawa, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01J 37/304 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/1472 (2013.01); H01J 37/304 (2013.01); H01J 37/3177 (2013.01); H01J 2237/1504 (2013.01);
Abstract
A charged particle beam writing apparatus includes a number of shots calculation circuit to calculate the number of shots in the case where a deflection region is irradiated with a shot of a charged particle beam, a deflection position correcting circuit to correct a deflection position of the charged particle beam to be shot in the deflection region, depending on the number of shots to be shot in the deflection region, and a deflector to deflect the charged particle beam to a corrected deflected position on the target object.