The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Nov. 28, 2018
Nuflare Technology, Inc., Yokohama-shi, JP;
Takuya Uemura, Yokohama, JP;
Takashi Nakamura, Yokohama, JP;
Hideki Matsui, Yokohama, JP;
Munehiro Ogasawara, Hiratsuka, JP;
Rieko Nishimura, Yokohama, JP;
Tatsuya Murofushi, Gotemba, JP;
Yoshiaki Hattori, Toshima-ku, JP;
NuFlare Technology, Inc., Yokohama-shi, JP;
Abstract
In one embodiment, a charged particle beam writing apparatus includes a deflector deflecting a charged particle beam, a first correcting lens and a second correcting lens correcting a focus position of the charged particle beam, a focus correction amount calculator calculating a first correction amount for the focus position according to a change in a height position of a sample surface, and calculating a second correction amount for the focus position according to a change in shot size of the charged particle beam, a first DAC (digital to analog converter) amplifier applying a voltage for a ground potential based on the first correction amount to the first correcting lens, and a second DAC amplifier applying a voltage for a ground potential based on the second correction amount to the second correcting lens, an output of the second DAC amplifier being smaller than an output of the first DAC amplifier.