Yokohama, Japan

Takashi Nakamura

This inventor holds 41 USPTO granted patents, primarily in Image Processing. Top assignees: Canon Kabushiki Kaisha, Nuflare Technology, Inc., Lapis Semiconductor Co., Ltd.. Active years: 2002-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takashi Nakamura. Retrieved from https://idiyas.com/inventor/takashi-nakamura-gup6dfi2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 48.8

Average Co-Inventor Count = 3.0

ph-index = 9

Forward Citations = 328(Granted Patents)


Company Filing History:


Years Active: 2002-2020

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Areas of Expertise:
Image Processing
Microstructure Manufacturing
X-ray Imaging
Charged Particle Beam
Ink-jet Recording
Phase Grating
Feature Classification
Patterned Media
Image Forming
Color Conversion
Rectifier Circuit
Information Processing
41 patents (USPTO):Explore Patents

Title: **The Innovative Journey of Takashi Nakamura**

Introduction

Takashi Nakamura is a distinguished inventor based in Yokohama, Japan. With an impressive portfolio of 41 patents, he has made significant contributions to the field of technology and engineering, particularly in printing and charged particle beam writing technologies. His diverse set of inventions reflects a deep commitment to innovation and advancement in various high-tech industries.

Latest Patents

Among his latest inventions, Nakamura has developed a printing apparatus and printing method designed to enhance the efficiency of ink usage. This invention addresses the challenge of monitoring remaining ink levels in tanks, enabling the system to determine whether the direction for printing an image should be inverted to equalize the ink distribution among the print heads. This innovation significantly reduces the discrepancies in ink remaining amounts, contributing to more efficient printing processes.

In addition, he holds a patent for a charged particle beam writing apparatus and method. This advanced system features a sophisticated deflector to manage the charged particle beam, along with a focus correction mechanism that adapts to changes in the sample surface's height and shot size. The inclusion of dual digital to analog converter (DAC) amplifiers allows for precise adjustments in focus position, further enhancing the accuracy and quality of the charged particle writing process.

Career Highlights

Nakamura's career has been marked by his tenure at prominent companies such as Canon and Nuflare Technology, Inc. His work has consistently pushed the boundaries of technology, paving the way for new applications and innovations in his field. His relentless pursuit of excellence and creativity has solidified his reputation as a leading inventor in the modern technological landscape.

Collaborations

Throughout his career, Nakamura has collaborated with esteemed colleagues such as Takashi Fujita and Tetsuya Suwa. These partnerships have fostered a dynamic environment for innovation, contributing to the development of groundbreaking technologies and advancements in their respective fields.

Conclusion

Takashi Nakamura's journey as an inventor exemplifies the power of innovation and collaboration in driving technological progress. With his extensive patent portfolio and commitment to excellence, he continues to inspire future generations of inventors and engineers in their pursuits of groundbreaking inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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