Takuya Uemura

Title: Takuya Uemura: Innovator in Charged Particle Beam Technology

Introduction

Takuya Uemura is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of charged particle beam technology. His innovative work has led to the development of advanced apparatuses and methods that enhance the precision and efficiency of charged particle beam writing.

Latest Patents

Uemura holds a patent for a "Charged particle beam writing apparatus and charged particle beam writing method." This invention includes a deflector that deflects a charged particle beam, along with a first and second correcting lens that adjust the focus position of the beam. The apparatus features a focus correction amount calculator that determines correction amounts based on changes in the height position of the sample surface and the shot size of the charged particle beam. Additionally, it utilizes digital to analog converter amplifiers to apply the necessary voltage adjustments to the correcting lenses.

Career Highlights

Takuya Uemura is currently employed at Nuflare Technology, Inc., where he continues to push the boundaries of innovation in his field. His work has been instrumental in advancing the capabilities of charged particle beam writing technologies. Uemura's dedication to research and development has positioned him as a key figure in the industry.

Collaborations

Uemura collaborates with talented individuals such as Takashi Nakamura and Hideki Matsui. Their combined expertise fosters a creative environment that drives innovation and enhances the development of new technologies.

Conclusion

Takuya Uemura's contributions to charged particle beam technology exemplify the spirit of innovation. His patent and ongoing work at Nuflare Technology, Inc. highlight his commitment to advancing this critical field. Uemura's achievements serve as an inspiration for future inventors and researchers.