Kanagawa, Japan

Yasuo Kato

USPTO Granted Patents = 40 

Average Co-Inventor Count = 2.3

ph-index = 6

Forward Citations = 138(Granted Patents)


Location History:

  • Saitama, JP (1993)
  • Kanagawa, JP (1994 - 2019)
  • Yokohama, JP (1978 - 2024)

Company Filing History:


Years Active: 1978-2025

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40 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Yasuo Kato - Pioneering Multi-Beam Writing Technologies in Kanagawa, JP

Introduction: Yasuo Kato is a prolific inventor based in Kanagawa, Japan, known for his groundbreaking work in multi-beam writing methods and apparatus. With an impressive portfolio of 38 patents, Kato has been at the forefront of technological advancements in the field of charged particle beam writing.

Latest Patents: Kato's latest patents include the "Multi-beam writing method and multi-beam writing apparatus" and the "Multiple charged particle beam writing apparatus and multiple charged particle beam writing method." These innovations demonstrate his expertise in optimizing beam irradiation processes to enhance pattern formation and minimize defects in charged particle beam writing applications.

Career Highlights: Currently employed at Nuflare Technology, Inc., Kato has played a key role in developing cutting-edge solutions for the semiconductor industry. His innovative approaches have revolutionized the way multi-beam writing is utilized in manufacturing processes, paving the way for more efficient and precise patterns on substrates.

Collaborations: Within Nuflare Technology, Inc., Kato has collaborated closely with colleagues such as Jun Yashima and Hiroshi Matsumoto. Together, they have synergized their skills and expertise to push the boundaries of charged particle beam writing technologies, creating impactful solutions for the industry.

Conclusion: Yasuo Kato's relentless pursuit of innovation and his remarkable contributions to the field of multi-beam writing technologies have solidified his reputation as a visionary inventor. His dedication to optimizing processes and improving outcomes in charged particle beam writing underscores his commitment to driving progress in the industry.

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