The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2019
Filed:
Apr. 04, 2018
Nuflare Technology, Inc., Yokohama-shi, JP;
Yasuo Kato, Yokohama, JP;
Ryoh Kawana, Yokohama, JP;
NuFlare Technology, Inc., Yokohama-shi, JP;
Abstract
According to one aspect of the present invention, a multiple charged particle beam lithography apparatus includes dose operation processing circuitry configured to, in a case that a pattern is written into a pattern writing region sufficiently larger than the setting region in a target object by using the multiple charged particle beams following the pattern writing sequence, operate an incident dose of a beam to each position intended inside the pattern writing region by continuously using repeatedly data of dose modulation value groups defined for a plurality of pixel regions of a same block among a plurality of blocks obtained by dividing a dose modulation map for each preset number of pixel regions without switching to data of dose modulation value groups of other blocks.