Nuflare Technology, Inc.

Fuji Xerox Co., Ltd.

Toshiba Kikai Kabushiki Kaisha

Canon Kabushiki Kaisha

U.S. Philips Corporation

Toshiba Machine Co., Ltd.

Nuflare Technology Co., Inc.

Yasuo Kato

Jun Yashima

Hiroshi Matsumoto

Ryoh Kawana

Kenichi Yasui

Shigehiro Hara

Akihito Anpo

Noriaki Nakayamada

Hideo Inoue

Mizuna Suganuma

Masafumi Ise

Takayuki Abe

Hideo Tsuchiya

Ryoichi Yoshikawa

Takashi Arai

Gerardus C Lokhoff

Hiroshi Iida

Tomohiro Iijima

Hironobu Matsumoto

Shinji Sakamoto

Jun Miyazaki

Hideo Fujie

Hayato Kimura

Satoshi Matsumoto

Hiroshi Yamashita

Tomoo Motosugi

Mitsuhiko Iida

Ryuichi Horigane

Saori Gomi

Kazuyuki Baba

Yoshiyuki Nakura

Masahito Sakakibara

Satoshi Koyama

Takao Tamura

Shigeru Matsuo

Norio Saitoh

Hironori Teguri

Motoo Kakiuchi

Kunio Okawa

Etsushi Sato

In one embodiment, a coverage calculating method is for calculating a coverage of a pattern in each of pixel regions obtained by dividing a writing region onto which the pattern is to be written by irradiation with a charged particle beam. Each of the pixel regions has a predetermined size. The method includes generating a plurality of first pixel regions by virtually dividing the writing region, the first pixel regions each having a first size, calculating a coverage of a pattern in the first pixel region, generating a plurality of second pixel regions by virtually dividing the first pixel region, the second pixel regions each having a second size smaller than the first size, selecting a second pixel region approximating a pattern shape in the first pixel region, and calculating a coverage in the selected second pixel region.

Coverage calculating method, charged particle beam writing method, coverage calculating device, charged particle beam writing apparatus, and computer-readable storage medium

A multi-charged particle beam writing apparatus includes a circuit to allocate an additional dose to a position inside a writing target pattern in order to change a first dose distribution by an excessive dose, generated on the target object by applying, in the multi-charged particle beams, an excessive dose defective beam, to a second dose distribution whose center is located inside the writing target pattern and for which beam irradiation canceling out the excessive dose and being in a range of the first dose distribution exists; and a circuit to perform correction by subtracting an increased dose amount, generated at the center of the second dose distribution because of the additional dose being allocated, from a dose with which one of the center of the second dose distribution and a vicinity of the center of the second dose distribution is irradiated.

Multi-charged particle beam writing apparatus and multi-charged particle beam writing method

In one embodiment, a multi-beam writing method is for irradiating each of pixels defined on a substrate, placed on a stage, with each beam of a multi-beam to form a pattern. The method includes obtaining a position correction amount of the pattern by each of a plurality of sub-arrays into which an array of the multi-beam is divided at least in a predetermined direction, based on the positional deviation amount of each beam of each of the sub-arrays, which obtained by dividing an array of the multi-beam at least in the predetermined direction, calculating an dose of the each beam irradiated to each pixel for shifting the position of the pattern drawn for each of the sub-arrays based on the position correction, and performing multi-writing using at least a portion of each two or more of the sub-arrays with the calculated dose.

Multi-beam writing method and multi-beam writing apparatus

A multiple charged particle beam writing apparatus includes a margined block region generation circuit to generate plural margined block regions each formed by adding a margin region to the periphery of each block region of plural block regions obtained by dividing the writing region of the target object, a detection circuit to detect a defective beam in multiple charged particle beams, a specifying circuit to specify, for each defective beam detected, a position irradiated with the defective beam, and an affiliation determination circuit to determine a margined block region, in the plural margined block regions, to which the position irradiated with the defective beam belongs, based on conditions set according to a sub-block region, in plural sub-block regions acquired by dividing the margined block region, in which the position irradiated with the defective beam in the multiple charged particle beams is located.

Multiple charged particle beam writing apparatus and multiple charged particle beam writing method

In one embodiment, a charged particle beam writing method includes virtually dividing a writing region of the substrate into a plurality of first mesh regions in a first mesh size, calculating an area density of the pattern for each of the plurality of first mesh regions to generate first mesh data, converting a mesh size of the first mesh data into a second mesh size greater than the first mesh size to generate second mesh data, performing a convolution operation between the second mesh data and a proximity effect correction kernel to generate third mesh data, converting a mesh size of the third mesh data into the first mesh size to generate fourth mesh data, performing a convolution operation between the first mesh data and a middle range effect correction kernel to generate fifth mesh data, and adding the fourth mesh data and the fifth mesh data together to calculate an irradiation amount of the charged particle beam for each of the plurality of first mesh regions.

Charged particle beam writing method and charged particle beam writing apparatus

In one embodiment, a first storage storing writing data, a second storage storing correction data for correcting an error in a writing position due to factors including bending of the substrate, a cell data allocator virtually dividing a writing region of the substrate into blocks, and allocating a cell to the blocks in consideration of the correction data, a plurality of bitmap data generators virtually dividing the blocks into meshes, calculating an irradiation amount per mesh region, and generating bitmap data which assigns the irradiation amount to each mesh region, and a shot data generator generating shot data that defines an irradiation time for each beam. The cell data allocator virtually divides the writing region by division lines in a direction different from a writing forward direction to generate a plurality of division regions. The plurality of bitmap data generators generate pieces of bitmap data of the different division regions.

Multi charged particle beam writing apparatus and multi charged particle beam writing method

In one embodiment, a method is for creating writing data used in a multi charged particle beam writing apparatus. The method includes partitioning a polygonal figure included in design data into a plurality of trapezoids that each include at least one pair of opposite sides parallel along a first direction and that join so as to be continuous in a second direction orthogonal to the first direction while a side parallel to the first direction serves as a common side, and creating the writing data by, when a first trapezoid, a second trapezoid, and a third trapezoid join along the second direction, representing a position of a common vertex shared by the second trapezoid and the third trapezoid using displacements in the first direction and the second direction from a position of a common vertex shared by the first trapezoid and the second trapezoid. In at least one of the plurality of trapezoids, different dose amounts are defined in the first direction.

Method of creating writing data

A apparatus according to an embodiment includes a unit to generate first blocks in a writing region in which at least one of writing groups respectively using different base doses is to be written, a unit to generate second blocks for proximity effect correction, in the each of the regions of the groups, a unit to calculate an area density in each of the first blocks, a unit to perform a weighting calculation on the area density for each of the first blocks by using a base dose of a corresponding group, a unit to calculate a dose coefficient for proximity effect correction, for each of the second blocks, by using a corresponding weighted area density, and a unit to calculate a dose by using the base dose of the each of the groups and the dose coefficient of the each of the second blocks.

Charged particle beam writing apparatus and charged particle beam writing method

A charged particle beam writing apparatus includes an area density calculation unit to calculate a pattern area density weighted using a dose modulation value, which has previously been input from an outside and in which an amount of correction of a dimension variation due to a proximity effect has been included, a fogging correction dose coefficient calculation unit to calculate a fogging correction dose coefficient for correcting a dimension variation due to a fogging effect by using the pattern area density weighted using the dose modulation value having been input from the outside, a dose calculation unit to calculates a dose of a charged particle beam by using the fogging correction dose coefficient and the dose modulation value, and a writing unit to write a pattern on a target object with the charged particle beam of the dose.

According to one aspect of the present invention, a multiple charged particle beam lithography apparatus includes dose operation processing circuitry configured to, in a case that a pattern is written into a pattern writing region sufficiently larger than the setting region in a target object by using the multiple charged particle beams following the pattern writing sequence, operate an incident dose of a beam to each position intended inside the pattern writing region by continuously using repeatedly data of dose modulation value groups defined for a plurality of pixel regions of a same block among a plurality of blocks obtained by dividing a dose modulation map for each preset number of pixel regions without switching to data of dose modulation value groups of other blocks.

Multiple charged particle beam lithography apparatus and multiple charged particle beam pattern writing method

In one embodiment, a drawing data creation method includes inputting correction-map-including drawing data having a correction map to a converter, the correction map including dose amount information for each mesh area obtained by dividing a drawing area on a target drawn by a charged particle beam drawing apparatus, the drawing area being divided in a mesh shape, converting dose amount information in a second mesh area adjacent to a first mesh area to a representation based on dose amount information in the first mesh area to compress data of the dose amount information in the second mesh area, and outputting compressed-correction-map-including drawing data having a compressed correction map to a controller, the compressed correction map including dose amount information in which data in each of the plurality of mesh areas has been compressed.

Drawing data creation method and charged particle beam drawing apparatus

A multi charged particle beam writing apparatus includes a modulation rate data calculation processing circuitry to calculate, for each pixel being a unit region, a modulation rate of a beam to a pixel concerned and each modulation rate of a beam to at least one pixel at a periphery of the pixel concerned, and a corrected-dose calculation processing circuitry to calculate, for the each pixel, a corrected dose by adding a multiplied value obtained by multiplying the modulation rate of the pixel concerned in a modulation rate map by beam dose to the pixel concerned, and a multiplied value obtained by multiplying the modulation rate of the pixel concerned which becomes one of the at least one pixel at the periphery with respect to another pixel defined for the position of the pixel concerned by a beam dose to the another pixel.

Multi charged particle beam writing apparatus, and multi charged particle beam writing method

A method for generating writing data to be input to a writing apparatus, which writes a figure pattern on a target object by using a charged particle beam, includes generating the writing data, based on a data format that sequentially defines figure information on a figure pattern, and dose information which is defined before or after the figure information and indicates one of a dose and a dose modulation rate for modulating a dose, for a position of each of corner points of the figure pattern.

Method for generating writing data

A multi charged particle beam writing apparatus includes a maximum irradiation time acquisition processing circuitry to acquire, for each shot of multi-beams, a maximum irradiation time of irradiation time of each of the multi-beams, a unit region writing time calculation processing circuitry to calculate, using the maximum irradiation time for each shot, a unit region writing time by totalizing the maximum irradiation time of each shot of a plurality of times of shots of the multi-beams which irradiate a unit region concerned during stage moving, for each unit region of a plurality of unit regions obtained by dividing a writing region of a target object, a stage speed calculation processing circuitry to calculate speed of the stage for each unit region so that the stage speed becomes variable, by using the unit region writing time and a stage control processing circuitry to variably control the stage speed.

Growing community of inventors

Kanagawa, Japan

Yasuo Kato