Wolfgang Harnisch

Title: Innovations of Wolfgang Harnisch

Introduction

Wolfgang Harnisch is a notable inventor based in Lehesten, Germany. He has made significant contributions to the field of measurement and mask inspection technologies. With a total of nine patents to his name, Harnisch's work has advanced the precision and efficiency of various industrial processes.

Latest Patents

Harnisch's latest patents include a method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section. This method is particularly relevant for lithography masks or wafers, where it involves imaging a region larger than the section and determining position errors based on measurement marks. Another significant patent is a method for mask inspection for mask design and production. This invention allows for early detection of weak points in mask designs through aerial image simulation, ultimately improving the mask production process while reducing costs and error rates.

Career Highlights

Throughout his career, Wolfgang Harnisch has worked with prominent companies such as Carl Zeiss SMS Ltd. and Carl Zeiss SMT AG. His expertise in measurement and mask inspection has positioned him as a key figure in the development of innovative technologies in these fields.

Collaborations

Harnisch has collaborated with notable colleagues, including Thomas Scheruebl and Thomas Engel. These partnerships have contributed to the advancement of his inventions and the successful implementation of his patented technologies.

Conclusion

Wolfgang Harnisch's contributions to the fields of measurement and mask inspection have made a lasting impact on industrial processes. His innovative patents and collaborations highlight his role as a leading inventor in these areas.