The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2007
Filed:
Aug. 13, 2004
Michael Totzeck, Schwaebisch Gmuend, DE;
Heiko Feldmann, Schwaebisch Gmuend, DE;
Toralf Gruner, Aalen-Hofen, DE;
Karl-heinz Schuster, Koenigsbronn, DE;
Joern Greif-wuestenbecker, Jena, DE;
Thomas Scheruebl, Jena, DE;
Wolfgang Harnisch, Lehesten, DE;
Norbert Rosenkranz, Reichenbach, DE;
Ulrich Stroessner, Jena, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Heiko Feldmann, Schwaebisch Gmuend, DE;
Toralf Gruner, Aalen-Hofen, DE;
Karl-Heinz Schuster, Koenigsbronn, DE;
Joern Greif-Wuestenbecker, Jena, DE;
Thomas Scheruebl, Jena, DE;
Wolfgang Harnisch, Lehesten, DE;
Norbert Rosenkranz, Reichenbach, DE;
Ulrich Stroessner, Jena, DE;
Carl Zeiss SMS GmbH, Jena, DE;
Abstract
An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.