Vienna, Austria

Joern Greif-Wuestenbecker


Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Marburg, DE (2005)
  • Jena, DE (2007 - 2009)
  • Vienna, AT (2009 - 2013)

Company Filing History:


Years Active: 2005-2013

Loading Chart...
6 patents (USPTO):Explore Patents

Title: Joern Greif-Wuestenbecker: Innovator in Optical Imaging Systems

Introduction

Joern Greif-Wuestenbecker is a prominent inventor based in Vienna, Austria. He has made significant contributions to the field of optical imaging systems, particularly in the area of lithography mask inspection. With a total of six patents to his name, his work has advanced the capabilities of imaging technologies.

Latest Patents

One of his latest patents is a "Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection." This innovative optical imaging system allows for the inspection of lithography masks by emulating high-aperture scanner systems. The system includes imaging optics, a detector, and an evaluating unit, with polarizing optical elements arranged to generate different polarization states. This enables the detection of defects in masks through various polarized beam components.

Another notable patent is the "Method for determining intensity distribution in the image plane of a projection exposure arrangement." This method enhances reproduction quality by emulating a large aperture imaging system. It involves determining the integrated amplitude distribution in an output pupil and applying a predetermined apodization correction to calculate a corrected apodization image.

Career Highlights

Throughout his career, Joern has worked with esteemed companies such as Carl Zeiss SMS Ltd. and Carl Zeiss Microelectronic Systems GmbH. His experience in these organizations has allowed him to refine his expertise in optical systems and contribute to groundbreaking innovations.

Collaborations

Joern has collaborated with notable colleagues, including Michael Totzeck and Ulrich Stroessner. These partnerships have fostered a collaborative environment that has led to the development of advanced imaging technologies.

Conclusion

Joern Greif-Wuestenbecker's contributions to optical imaging systems have significantly impacted the field of lithography mask inspection. His innovative patents and collaborations highlight his dedication to advancing technology in this area. His work continues to influence the future of imaging systems.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…