The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2011
Filed:
Sep. 02, 2006
Joern Greif-wuestenbecker, Vienna, AT;
Beate Boehme, Grosspuerschuetz, DE;
Ulrich Stroessner, Jena, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Vladimir Kamenov, Essingen, DE;
Olaf Dittmann, Bopfingen, DE;
Daniel Kraehmer, Essingen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Bernd Geh, Scottsdale, AZ (US);
Joern Greif-Wuestenbecker, Vienna, AT;
Beate Boehme, Grosspuerschuetz, DE;
Ulrich Stroessner, Jena, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Vladimir Kamenov, Essingen, DE;
Olaf Dittmann, Bopfingen, DE;
Daniel Kraehmer, Essingen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Bernd Geh, Scottsdale, AZ (US);
Carl Zeiss SMS GmbH, Jena, DE;
Abstract
A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.