Bopfingen, Germany

Olaf Dittmann


 

Average Co-Inventor Count = 5.8

ph-index = 3

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2009-2018

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14 patents (USPTO):Explore Patents

Title: The Innovations of Olaf Dittmann

Introduction

Olaf Dittmann is a prominent inventor based in Bopfingen, Germany. He has made significant contributions to the field of microlithography, holding a total of 14 patents. His work focuses on optical systems and methods that enhance the precision of lithographic processes.

Latest Patents

Among his latest patents is an optical system for a microlithographic projection exposure apparatus. This invention includes a mirror arrangement with multiple independently displaceable mirror elements, allowing for the alteration of the angular distribution of light. Additionally, he has developed a method for lithographically transferring patterns onto light-sensitive surfaces, which is crucial in multiple exposure processes.

Career Highlights

Olaf Dittmann has worked with notable companies such as Carl Zeiss SMT GmbH and Carl Zeiss SMT AG. His experience in these organizations has allowed him to refine his expertise in optical systems and lithographic technologies.

Collaborations

Throughout his career, Dittmann has collaborated with esteemed colleagues, including Michael Totzeck and Toralf Gruner. These partnerships have contributed to the advancement of his innovative projects.

Conclusion

Olaf Dittmann's contributions to microlithography and optical systems have established him as a key figure in the field. His patents reflect a commitment to innovation and precision in technology.

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