The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 05, 2010

Filed:

Jun. 28, 2006
Applicants:

Toralf Gruner, Aalen-Hofen, DE;

Olaf Conradi, Westerhofen, DE;

Nils Dieckmann, Hüttlingen, DE;

Markus Schwab, Herzogenaurach, DE;

Olaf Dittmann, Bopfingen, DE;

Michael Totzeck, Schwaebisch Gmuend, DE;

Daniel Kraehmer, Aalen, DE;

Vladimir Kamenov, Essingen, DE;

Inventors:

Toralf Gruner, Aalen-Hofen, DE;

Olaf Conradi, Westerhofen, DE;

Nils Dieckmann, Hüttlingen, DE;

Markus Schwab, Herzogenaurach, DE;

Olaf Dittmann, Bopfingen, DE;

Michael Totzeck, Schwaebisch Gmuend, DE;

Daniel Kraehmer, Aalen, DE;

Vladimir Kamenov, Essingen, DE;

Assignee:

Carl Zeiss SMT AG, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object () arranged in an object plane () onto a substrate () arranged in an image plane (). The object () is illuminated with light of an operating wavelength of the projection exposure apparatus according to one of several adjustable exposure modes. The light produces changes in at least one optical element () of the projection exposure apparatus, by which the optical properties of the projection exposure apparatus are influenced. The operation of the projection exposure apparatus makes allowance for the influencing of the optical properties of the projection exposure apparatus or a quantity dependent on the former, being calculated approximately on the basis of the exposure mode used and the structure of the object ().


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