Essingen, Germany

Daniel Kraehmer

USPTO Granted Patents = 41 

 

Average Co-Inventor Count = 4.3

ph-index = 6

Forward Citations = 183(Granted Patents)


Location History:

  • Oberkochen, DE (2004)
  • Aalen, DE (2006 - 2014)
  • Essingen, DE (2008 - 2019)

Company Filing History:


Years Active: 2004-2019

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41 patents (USPTO):Explore Patents

Title: A Profile of Daniel Kraehmer: Innovator in Microlithography

Introduction

Daniel Kraehmer, a prolific inventor based in Essingen, Germany, has an impressive portfolio of 41 patents to his name. His work predominantly focuses on advancements in microlithography, which plays a crucial role in the manufacturing of microchips and other precision components. His innovations in optical technology have significantly impacted the fields of optics and imaging.

Latest Patents

Among Kraehmer's most notable recent patents are those related to microlithography projection objectives. One such patent describes advanced microlithography projection objectives aimed at suppressing false light during the imaging of patterns from an object plane to an image plane. Additionally, his patent regarding lithography projection objectives centers on a method for correcting image defects. This particular invention includes a tunable projection objective comprised of multiple optical elements, with a focus on optimizing performance when using immersion media with a higher refractive index. The innovations in these patents reflect his commitment to advancing image quality and precision in optical technologies.

Career Highlights

Throughout his career, Daniel Kraehmer has worked with esteemed organizations, including Carl Zeiss SMT GmbH and Carl Zeiss SMT AG. His roles at these companies provided him with a platform to develop groundbreaking technologies in lithography and optics, solidifying his status as a leading figure in the field. Kraehmer's expertise and inventions have contributed significantly to advancements in semiconductor manufacturing and imaging technologies.

Collaborations

Collaboration has been a vital aspect of Kraehmer's journey as an inventor. He has had the opportunity to work alongside talented individuals such as Toralf Gruner and Michael Totzeck. These partnerships have facilitated the exchange of ideas and fostered the development of innovative solutions in optics and photonics.

Conclusion

Daniel Kraehmer's contributions to the field of microlithography and optical technology resonate through his numerous patents and successful collaborations. His dedicated work continues to inspire advancements in the industry, ensuring that future innovations in imaging and precision engineering remain on the cutting edge. As a prominent inventor in the realm of optics, Kraehmer's legacy will undoubtedly influence the next generation of scientists and engineers.

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