The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2017
Filed:
Mar. 14, 2014
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Ingo Saenger, Heidenheim, DE;
Joerg Zimmermann, Aalen, DE;
Daniel Kraehmer, Essingen, DE;
Johannes Ruoff, Aalen, DE;
Martin Meier, Heidenheim, DE;
Frank Schlesener, Oberkochen, DE;
Christoph Hennerkes, Huettlingen, DE;
Wolfgang Singer, Aalen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01); G21K 1/06 (2006.01); G02B 19/00 (2006.01); G02B 27/28 (2006.01); B82Y 10/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/702 (2013.01); B82Y 10/00 (2013.01); G02B 19/0023 (2013.01); G02B 19/0047 (2013.01); G02B 19/0071 (2013.01); G02B 19/0095 (2013.01); G02B 27/286 (2013.01); G03F 7/70166 (2013.01); G03F 7/70175 (2013.01); G03F 7/70566 (2013.01); G21K 1/062 (2013.01); G21K 2201/061 (2013.01); G21K 2201/064 (2013.01); G21K 2201/067 (2013.01);
Abstract
A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon during the focusing of radiation from a first focus into a second focus with angles of impingement in a predefined angular spectrum.