Martin Meier

Title: The Innovations of Martin Meier

Introduction

Martin Meier is a notable inventor based in Heidenheim, Germany. He has made significant contributions to the field of microlithography, holding a total of five patents. His work focuses on enhancing the efficiency and effectiveness of projection exposure apparatuses.

Latest Patents

One of his latest patents is a collector designed for a projection exposure apparatus for microlithography. This collector comprises a plurality of reflective sections that are arranged to be impinged upon during the focusing of radiation from a first focus into a second focus, with angles of impingement in a predefined angular spectrum. Another significant patent is an illumination optical unit for projection lithography. This unit features a first polarization mirror device that reflects and polarizes illumination light. A second mirror device, positioned downstream of the polarization mirror device, reflects an illumination light beam. The two mirror devices can be displaced relative to one another via a drive device, allowing for flexible predefinition of different illumination geometries, particularly those with rotationally symmetrical illumination.

Career Highlights

Throughout his career, Martin Meier has worked with prominent companies such as Carl Zeiss SMT GmbH and BSH Bosch und Siemens Hausgeräte GmbH. His experience in these organizations has contributed to his expertise in the field of optical systems and microlithography.

Collaborations

Martin has collaborated with notable coworkers, including Ingo Saenger and Joerg Zimmermann. Their combined efforts have further advanced the innovations in their respective fields.

Conclusion

Martin Meier's contributions to microlithography through his patents and collaborations highlight his significant role as an inventor. His work continues to influence advancements in optical technologies.