Carl Zeiss Smt Gmbh

Bsh Bosch Und Siemens Hausgeraete Gmbh

Bayerisches Zentrum Für Angewandte Energieforschung E.v. Zae Bayern

Martin Meier

Johannes Ruoff

Frank Schlesener

Ingo Saenger

Joerg Zimmermann

Christoph Hennerkes

Wolfgang Singer

Michael Patra

Daniel Kraehmer

Hans-Peter Ebert

Werner Körner

Michaela Reim

Helmut Weinlälader

A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon during the focusing of radiation from a first focus into a second focus with angles of impingement in a predefined angular spectrum.

Collector

An illumination optical unit for projection lithography has a first polarization mirror device to reflect and polarize of illumination light. A second mirror device, which is disposed downstream of the polarization mirror device reflects an illumination light beam. At least one drive device is operatively connected to at least one of the two mirror devices. The two mirror devices are displaceable relative to one another via the drive device between a first relative position, which leads to a first beam geometry of the illumination light beam after reflection at the second mirror device, and a second relative position, which leads to a second beam geometry of the illumination light beam after reflection at the second mirror device, which is different from the first beam geometry. This results in a flexible predefinition of different illumination geometries, in particular of different illumination geometries with rotationally symmetrical illumination.

Illumination optical unit for projection lithography

The disclosure relates to optical systems of a microlithographic projection exposure apparatus, and to a microlithographic exposure method. According to an aspect of the disclosure, an optical system has a light source, a ray-splitting optical element, which splits a light ray incident on this element when the projection exposure apparatus is in operation into a first partial ray and a second partial ray, with the first and the second partial ray having mutually orthogonal polarization directions, and at least one ray-deflecting optical element for generating a desired polarized illumination setting from the first partial ray and the second partial ray, wherein the ray-splitting optical element is arranged such that light incident on this ray-splitting optical element when the projection exposure apparatus is in operation has a degree of polarization of less than one.

Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure

A lighting device for an oven having an oven muffle defining an oven muffle chamber is provided. The lighting device includes one light source configured for illuminating the muffle chamber and one partition for separating the light source from the muffle chamber. The lighting device also includes insulation material disposed between the partition and the at least one light source.

Lighting device for ovens, and oven

The present invention relates to an apparatus for influencing a light beam arrangement comprising a plurality of light beams () arranged alongside one another, wherein provision is made of at least one optical element () which is movable transversely with respect to the light beams and by which the light beams can be influenced if the light beams pass through the optical element, and which has at least one light-absorbing region (), wherein the apparatus comprises a drive device for the optical element, a measuring device for detecting the light of the light beam and a control unit, wherein the control unit is designed such that the drive device is controlled in a manner dependent on the position of the light-absorbing region. Furthermore, the present invention also relates to a projection exposure apparatus for microlithography comprising a multi-mirror array, in which the corresponding apparatus can be used, and to a method for operating the corresponding apparatus or the projection exposure apparatus.

Polarization actuator

Growing community of inventors

Heidenheim, Germany

Martin Meier