The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2017

Filed:

May. 20, 2011
Applicants:

Vladimir Kamenov, Essingen, DE;

Daniel Kraehmer, Essingen, DE;

Toralf Gruner, Aalen-Hofen, DE;

Karl-stefan Weissenrieder, Elchingen, DE;

Heiko Feldmann, Aalen, DE;

Achim Zirkel, Munich, DE;

Alexandra Pazidis, Aalen, DE;

Bruno Thome, Aalen, DE;

Stephan Six, Aalen, DE;

Inventors:

Vladimir Kamenov, Essingen, DE;

Daniel Kraehmer, Essingen, DE;

Toralf Gruner, Aalen-Hofen, DE;

Karl-Stefan Weissenrieder, Elchingen, DE;

Heiko Feldmann, Aalen, DE;

Achim Zirkel, Munich, DE;

Alexandra Pazidis, Aalen, DE;

Bruno Thome, Aalen, DE;

Stephan Six, Aalen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01); G02B 1/11 (2015.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G02B 1/11 (2013.01); G03F 7/70191 (2013.01); G03F 7/70308 (2013.01); G03F 7/70958 (2013.01);
Abstract

The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.


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