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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9535332 B1

PDFFull Text
Expired
Date of Patent:
Jan. 03, 2017

Filed:

Dec. 14, 2012

Mask for euv lithography, euv lithography system and method for optimising the imaging of a mask

Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Johannes Ruoff, Aalen, DE;

Daniel Kraehmer, Essingen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:

Edell, Shapiro & Finnan, LLC

Primary Examiner:

Peter B Kim

Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); G03F 1/24 (2012.01); G03F 1/22 (2012.01);
U.S. Cl.
CPC ...
G03F 7/70141 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 1/22 (2013.01); G03F 1/24 (2013.01);
Abstract

A mask () for EUV lithography includes a substrate (), a multi-layer coating () applied to the substrate () and a mask structure () which is applied to the multi-layer coating () and which has an absorber material, the mask structure () having a maximum thickness of less than 100 nm, preferably not exceeding a maximum thickness of 30 nm, particularly preferably 20 nm, in particular 10 nm. Also disclosed is an EUV lithography system having such a mask () and a method for optimizing the imaging of such a mask ().

Find Patent Forward Citations

Ruoff, Johannes. (2017). Mask for euv lithography, euv lithography system and method for optimising the imaging of a mask (U.S. Patent No. 9535332). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9535332

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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