The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2014
Filed:
Sep. 26, 2011
Ulrich Loering, Schwaebisch Gmuend, DE;
Vladan Blahnik, Aalen, DE;
Wilhelm Ulrich, Aalen, DE;
Daniel Kraehmer, Essingen, DE;
Norbert Wabra, Werneck, DE;
Ulrich Loering, Schwaebisch Gmuend, DE;
Vladan Blahnik, Aalen, DE;
Wilhelm Ulrich, Aalen, DE;
Daniel Kraehmer, Essingen, DE;
Norbert Wabra, Werneck, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The disclosure provides a microlithography projection objective which includes a plurality of optical elements along the optical axis of the projection objective. The plurality of optical elements includes a last optical element and a penultimate optical element. A distance between the last optical element and the penultimate optical element is variable. The disclosure also provides a microlithography projection exposure machine including such a projection objective, and a method of making semiconductor components using such a projection exposure machine.