The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2013
Filed:
Apr. 07, 2009
Daniel Kraehmer, Essingen, DE;
Wilhelm Ulrich, Aalen, DE;
Matthias Manger, Aalen-Unterkochen, DE;
Bernhard Gellrich, Aalen, DE;
Daniel Kraehmer, Essingen, DE;
Wilhelm Ulrich, Aalen, DE;
Matthias Manger, Aalen-Unterkochen, DE;
Bernhard Gellrich, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An optical system, in particular a projection objective, for microlithography, has an optical axis and at least one optical correction arrangement, which has a first optical correction element and at least one second optical correction element, wherein the first correction element is provided with a first aspherical surface contour, and wherein the second correction element is provided with a second aspherical surface contour, wherein the first surface contour and the second surface contour add up at least approximately to zero, wherein the correction arrangement has at least one drive for movement of at least one of the two correction elements. In this case, at least one of the two correction elements can rotate about a rotation axis which is at least approximately parallel to the optical axis, and the at least one drive is a rotary drive for rotation of one or both of the correction elements about the rotation axis.