The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2012
Filed:
Jun. 09, 2011
Karl-heinz Schuster, Koenigsbronn, DE;
Heiko Feldmann, Aalen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Wilfried Clauss, Tuebingen, DE;
Susanne Beder, Aalen, DE;
Daniel Kraehmer, Essingen, DE;
Olaf Dittmann, Bopfingen, DE;
Karl-Heinz Schuster, Koenigsbronn, DE;
Heiko Feldmann, Aalen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Wilfried Clauss, Tuebingen, DE;
Susanne Beder, Aalen, DE;
Daniel Kraehmer, Essingen, DE;
Olaf Dittmann, Bopfingen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.