The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 01, 2010

Filed:

Feb. 22, 2006
Applicants:

Michael Totzeck, Schwaebisch Gmuend, DE;

Heiko Feldmann, Schwaebisch Gmuend, DE;

Daniel Kraehmer, Aalen, DE;

Olaf Dittmann, Bopfingen, DE;

Inventors:

Michael Totzeck, Schwaebisch Gmuend, DE;

Heiko Feldmann, Schwaebisch Gmuend, DE;

Daniel Kraehmer, Aalen, DE;

Olaf Dittmann, Bopfingen, DE;

Assignee:

Carl Zeiss SMT AG, Oberkochen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 4/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a method for describing, evaluating and improving optical polarization properties of a projection objective of a microlithographic projection exposure apparatus, the Jones or Stokes vectors are firstly determined at one or more points in the exit pupil of the projection objective. These are then described at least approximately as a linear superposition of predetermined vector modes with scalar superposition coefficients. The optical polarization properties can subsequently be evaluated on the basis of the superposition coefficients.


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