The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2009
Filed:
Sep. 22, 2005
Michael Totzeck, Gmuend, DE;
Gerhart Fuerter, Ellwangen, DE;
Olaf Dittmann, Bopfingen, DE;
Karl-heinz Schuster, Koenigsbronn, DE;
David Shafer, Fairfield, CT (US);
Susanne Beder, Aalen, DE;
Wolfgang Singer, Aalen, DE;
Michael Totzeck, Gmuend, DE;
Gerhart Fuerter, Ellwangen, DE;
Olaf Dittmann, Bopfingen, DE;
Karl-Heinz Schuster, Koenigsbronn, DE;
David Shafer, Fairfield, CT (US);
Susanne Beder, Aalen, DE;
Wolfgang Singer, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
The invention relates to an arrangement of optical elements in a microlithographic projection exposure apparatus, particularly in a projection objective of a microlithographic projection exposure apparatus. The arrangement comprises a rigid first optical element, a rigid second optical element with a first optical surface and a second optical surface on opposite sides and a first liquid. The first optical element has a concave optical surface. The first side of the second optical element is facing the concave optical surface of the first optical element. The first liquid is at least partially filling the space between the first optical element and the second optical element.