The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Apr. 12, 2006
Hans-juergen Mann, Oberkochen, DE;
Wolfgang Singer, Aalen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Olaf Dittmann, Bopfingen, DE;
Michael Totzeck, Gmuend, DE;
Hans-Juergen Mann, Oberkochen, DE;
Wolfgang Singer, Aalen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Olaf Dittmann, Bopfingen, DE;
Michael Totzeck, Gmuend, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source for producing light in the EUV region. The projection exposure system further comprises a first optical system for illuminating a mask by the light of the light source and a second optical system for imaging the mask on a component. At least one polarization-optical element is disposed on the beam path between the light source and the component.