Inventors with similar research interests:
Location History:
- Oberkochem, DE (2005)
- Okerkochen, DE (2008)
- Veldhoven, NL (2008)
- Oberkocken, DE (2013)
- Oberkochen, DE (2005 - 2019)
Company Filing History:
94 out of 1,405 
23 out of 461 
2 out of 4,883 
Years Active: 2005-2019
Title: Hans-Juergen Mann: The Innovative Mind behind Optical Imaging Systems
Introduction:
Hans-Juergen Mann, a renowned inventor hailing from Oberkochen, DE, is a visionary in the field of optical imaging systems. With an impressive collection of 119 patents to his name, Mann has made groundbreaking contributions to the realm of microlithography and EUV mask inspection. This article will delve into his latest patents, career highlights, notable collaborations, and shed light on his tremendous contributions to the field.
Latest Patents:
Mann's recent patents showcase his expertise in the design and development of imaging optical systems and projection exposure installations for microlithography. Notably, one of his inventions involves an imaging optical system with a pupil obscuration, providing minimal imaging errors, efficient production, and excellent throughput for imaging light. Another innovative creation is a magnifying imaging optical unit that enables the inspection of lithography masks, allowing magnification adjustments to accommodate different mask structures.
Career Highlights:
Throughout his career, Mann has made significant contributions to the advancement of optical imaging technologies. He has held prominent positions at esteemed companies such as Carl Zeiss SMT GmbH and ASML Netherlands B.V. (formerly known as ASML Holding N.V.), where he has actively worked on pushing the boundaries of optical imaging systems. His relentless pursuit of innovation has resulted in the development of cutting-edge technologies that have revolutionized the semiconductor industry.
Collaborations:
In his professional journey, Mann has collaborated with several notable individuals who have likewise left their marks on the world of optical imaging. One such collaborator is Wilhelm Ulrich, who has contributed significantly to the field of optical metrology. Together, Mann and Ulrich have worked on various projects, combining their expertise to drive innovation and solve complex challenges. Another key collaborator of Mann's is David Shafer, a visionary in optical system design. Shafer's expertise complements Mann's, fostering an environment of creative problem-solving and breakthrough inventions.
Conclusion:
Hans-Juergen Mann's extensive patent portfolio and exceptional contributions to optical imaging systems showcase his unwavering commitment to innovation and technological advancement. His pioneering work in microlithography and EUV mask inspection has transformed the semiconductor industry, benefiting numerous companies and driving progress in the field. Collaborations with esteemed professionals like Wilhelm Ulrich and David Shafer have further amplified his impact. Over the years, Mann's inventions have demonstrated remarkable precision, efficiency, and adaptability, solidifying his position as a trailblazer in the world of optical imaging systems.
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