The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2017
Filed:
Apr. 02, 2015
Carl Zeiss Smt Gmbh, Oberkochen, DE;
David Shafer, Fairfield, CT (US);
Wilhelm Ulrich, Aalen, DE;
Aurelian Dodoc, Heidenheim, DE;
Rudolf Murai von Buenau, Jena, DE;
Hans-Juergen Mann, Oberkochen, DE;
Alexander Epple, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A projection objective configured to image an object field in an object plane into an image field in an image field plane includes a reflective unit, a first refractive unit, and a second refractive unit. An optical axis of the first refractive unit is parallel to but displaced from an optical axis of the second refractive unit. The reflective unit includes a first curved mirror and a second curved mirror. The second curved mirror is immediately downstream from the first curved mirror in a path of light from the object plane to the image plane. The projection objective is a microlithography projection objective.