Jena, Germany

Rudolf Von Buenau

This inventor holds 23 USPTO granted patents and 7 published patent applications, primarily in Optical Systems. Top assignees: Carl Zeiss Smt Gmbh, Carl-Zeiss-Smt Ag, Carl Zeiss Meditec Ag. Active years: 2004-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rudolf Von Buenau. Retrieved from https://idiyas.com/inventor/rudolf-von-buenau

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 21.7

Average Co-Inventor Count = 5.4

ph-index = 7

Forward Citations = 146(Granted Patents)


Location History:

  • Essingen, DE (2004 - 2010)
  • Jena, DE (2006 - 2017)

Company Filing History:


Years Active: 2004-2017

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Areas of Expertise:
Catadioptric Projection
Optical Systems
Microlithography
Projection Objectives
Depth Resolution
Focal Depth
Pupillary Filtering
Projection Lens
Illumination Method
Optical Coherence Reflectometry
23 patents (USPTO):Explore Patents

Title: Rudolf Von Buenau - Innovative Inventor from Jena

Introduction: Rudolf Von Buenau is a renowned inventor hailing from Jena, Germany, known for his groundbreaking contributions to various technological fields.

Latest Patents: Rudolf Von Buenau holds several patents in the areas of renewable energy, nanotechnology, and medical devices, showcasing his diverse range of expertise and innovation.

Career Highlights: With a career spanning over two decades, Rudolf Von Buenau has worked with leading research institutions and companies to develop cutting-edge solutions that have revolutionized industries worldwide.

Collaborations: Throughout his career, Rudolf Von Buenau has collaborated with top scientists, engineers, and inventors, fostering a culture of innovation and excellence in all his projects.

Conclusion: Rudolf Von Buenau's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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