The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2018
Filed:
Oct. 25, 2012
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Ingo Saenger, Heidenheim, DE;
Ralf Scharnweber, Aalen, DE;
Olaf Dittmann, Bopfingen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Gundula Weiss, Aalen, DE;
Andras G. Major, Oberkochen, DE;
Martin Vogt, Mutlangen, DE;
Markus Deguenther, Aalen, DE;
Johannes Wangler, Koenigsbronn, DE;
Thomas Korb, Schwaebisch Gmuend, DE;
Severin Waldis, Bern, CH;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.