The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Apr. 20, 2004
Hans-juergen Dobschal, Kleinromstedt, DE;
Wolfgang Harnisch, Lehesten, DE;
Thomas Scheruebl, Jena, DE;
Nobert Rosenkranz, Reichenbach, DE;
Ralph Semmler, Jena, DE;
Hans-Juergen Dobschal, Kleinromstedt, DE;
Wolfgang Harnisch, Lehesten, DE;
Thomas Scheruebl, Jena, DE;
Nobert Rosenkranz, Reichenbach, DE;
Ralph Semmler, Jena, DE;
Carl Zeiss SMS GmbH, Jena, DE;
Abstract
Apparatus for inspecting objects especially masks in microlithography that are disposed in a vacuum chamber. The apparatus includes a converter for converting illuminating radiation emitted from the object into a radiation of a higher wavelength. A sensor for recording images is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.