Ralph Semmler

Title: Ralph Semmler: Innovator in Microlithography Inspection Technology

Introduction

Ralph Semmler is a notable inventor based in Jena, Germany. He has made significant contributions to the field of microlithography, particularly in the inspection of objects used in this technology. His innovative approach has led to the development of a unique apparatus that enhances the inspection process.

Latest Patents

Ralph Semmler holds a patent for an "Arrangement for inspecting objects, especially masks in microlithography." This apparatus is designed to inspect objects, particularly masks, that are situated within a vacuum chamber. The technology includes a converter that transforms illuminating radiation emitted from the object into radiation of a higher wavelength. Additionally, a sensor for recording images is positioned outside the vacuum chamber, serving as an optical interface between the vacuum chamber and the sensor of the converter. At least one part of the image lens is arranged as a window in the vacuum chamber, facilitating effective inspection.

Career Highlights

Ralph Semmler is associated with Carl Zeiss SMS Ltd., a company renowned for its advancements in optical systems and technologies. His work at this esteemed organization has allowed him to push the boundaries of microlithography inspection technology.

Collaborations

Throughout his career, Ralph has collaborated with esteemed colleagues such as Hans-Juergen Dobschal and Wolfgang Harnisch. These partnerships have contributed to the development and refinement of innovative technologies in the field.

Conclusion

Ralph Semmler is a distinguished inventor whose work in microlithography inspection technology has made a significant impact. His patent and contributions to Carl Zeiss SMS Ltd. highlight his dedication to advancing this critical area of technology.