The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
Jul. 06, 2012
Applicants:
Dirk Seidel, Jena, DE;
Michael Arnz, Oberkochen, DE;
Inventors:
Dirk Seidel, Jena, DE;
Michael Arnz, Oberkochen, DE;
Assignees:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Carl Zeiss SMS GmbH, Jena, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06F 19/00 (2011.01); G03F 1/00 (2012.01); G21K 5/00 (2006.01); G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5009 (2013.01); G06F 17/5081 (2013.01); G06F 19/00 (2013.01); G03F 1/00 (2013.01); G21K 5/00 (2013.01); G06K 9/00 (2013.01);
Abstract
A method and an apparatus for determining the position of a structure on a mask for microlithography, in which the position is determined by comparing an aerial image, measured by a recording device, of a portion of the mask with an aerial image determined by simulation. The position determination includes carrying out a plurality of such comparisons which differ from one another with regard to the input parameters of the simulation.