Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

The Procter Gamble Company

Braun Gmbh

Oswald Gromer

Joachim Stuehler

Ulrich Mueller

Rolf Freimann

Bernhard Geuppert

Paul Kaufmann

Matthias Manger

Michael Arnz

Gerd Klose

Heiko Feldmann

Norbert Schaefer

Michael Layh

Markus Schwab

Karl Herzog

Michael Stolper

Andreas Kramp

Michael Sauer

Erik Matthias Sohmen

An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.

Illumination system and projection objective of a mask inspection apparatus

A projection exposure system () for microlithography which includes: a mask holding device () holding a mask () with mask structures () disposed on the mask, a substrate holding device () holding a substrate (), projection optics () imaging the mask structures () onto the substrate () during an exposure process, and a measurement structure () disposed in a defined position with respect to a reference element () of the projection exposure system (), which defined position is mechanically uncoupled from the position of the mask holding to device (). The projection exposure system () also includes a detector () arranged to record an image of the measurement structure () imaged by the projection optics (). The projection exposure system () is configured such that during operation of the projection exposure system () the imaging of the mask structures () and the imaging of the measurement structure () take place at the same time by the projection optics (. An evaluation device () is configured to establish a lateral position of the image of the measurement structure () in the area of the detector () during the exposure process.

Projection exposure system for microlithography with a measurement device

A projection exposure system () for microlithography which includes: a mask holding device () holding a mask () with mask structures () disposed on the mask, a substrate holding device () holding a substrate (), projection optics () imaging the mask structures () onto the substrate () during an exposure process, and a measurement structure () disposed in a defined position with respect to a reference element () of the projection exposure system (), which defined position is mechanically uncoupled from the position of the mask holding device (). The projection exposure system () also includes a detector () arranged to record an image of the measurement structure () imaged by the projection optics (). The projection exposure system () is configured such that during operation of the projection exposure system () the imaging of the mask structures () and the imaging of the measurement structure () take place at the same time by the projection optics (. An evaluation device () is configured to establish a lateral position of the image of the measurement structure () in the area of the detector () during the exposure process.

A dental cleaning system for providing a liquid jet for a mouth rinse includes a nozzle member, a nozzle attachment coupled to the nozzle member to define an axially extending chamber, a liquid duct configured to supply pressurized liquid to the chamber, a pressure piece disposed within the chamber, and a nozzle outlet extending out of the chamber and configured to discharge a cleaning jet.

Spray nozzle and dental cleaning system

A scattered light measurement device includes an illumination mask providing measuring radiation on an entrance side () of a test component () and a detection part (-) for detection of light scattered by the test component and disposed on an exit side () of the test component. The illumination mask includes at least one scattered light measurement structure, wherein the scattered light measurement structure has a scattered light marker zone and wherein the scattered light marker zone has a rotationally non-symmetric shape.

Device and method for range-resolved determination of scattered light, and an illumination mask

An illumination mask () for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures () which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone () in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium. Applications include, for example, the range-resolved determination of scattered light of projection objectives in microlithography projection-exposure systems.

Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field mask

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Heidenheim, Germany

Oswald Gromer