The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2018
Filed:
Jun. 30, 2017
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Ulrich Mueller, Aalen, DE;
Joachim Stuehler, Aalen, DE;
Oswald Gromer, Heidenheim, DE;
Rolf Freimann, Aalen, DE;
Paul Kaufmann, Aalen, DE;
Bernhard Geuppert, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A projection exposure system () for microlithography which includes: a mask holding device () holding a mask () with mask structures () disposed on the mask, a substrate holding device () holding a substrate (), projection optics () imaging the mask structures () onto the substrate () during an exposure process, and a measurement structure () disposed in a defined position with respect to a reference element () of the projection exposure system (), which defined position is mechanically uncoupled from the position of the mask holding to device (). The projection exposure system () also includes a detector () arranged to record an image of the measurement structure () imaged by the projection optics (). The projection exposure system () is configured such that during operation of the projection exposure system () the imaging of the mask structures () and the imaging of the measurement structure () take place at the same time by the projection optics (. An evaluation device () is configured to establish a lateral position of the image of the measurement structure () in the area of the detector () during the exposure process.