Ulrich Mueller

This inventor holds 16 USPTO granted patents and 4 published patent applications, primarily in EUV Lithography. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2013-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ulrich Mueller. Retrieved from https://idiyas.com/inventor/ulrich-mueller-bofwg4xh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 16 (Patent Applications = 4)

% Patents Active = 81.3

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 18(Granted Patents)

Company Filing History:

16 out of 1,485

Carl Zeiss Smt Gmbh

patents

Years Active: 2013-2024

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Areas of Expertise:

EUV Lithography

Illumination Systems

Projection Exposure Systems

Optical Membrane Elements

Mathematical Modeling

Intensity Adaptation Filter

Measurement Devices

Mask Inspection

16 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12164102 - Method for generating a mathematical model for positioning individual mirrors of a facet mirror in an optical system (2024-12-10),

2. 11500294 - Method for replacing a mirror in a projection exposure apparatus, and position- and orientation data measuring device for carrying out the method (2022-11-15),

3. 11187989 - Method for determining properties of an EUV source (2021-11-30),

4. 11048172 - Method for producing an illumination system for an EUV projection exposure system, and illumination system (2021-06-29),

5. 10809625 - Intensity adaptation filter for EUV microlithography, method for producing same, and illumination system having a corresponding filter (2020-10-20),

6. 10514608 - Method for producing an illumination system for an EUV projection exposure system, and illumination system (2019-12-24),

7. 10254655 - Optical membrane element having a longitudinally adjustable connecting element (2019-04-09),

8. 10114293 - Illumination system and projection objective of a mask inspection apparatus (2018-10-30),

9. 10042271 - Projection exposure system for microlithography with a measurement device (2018-08-07),

10. 9720328 - Projection exposure system for microlithography and method of monitoring a lateral imaging stability (2017-08-01),

11. 9696639 - Projection exposure system for microlithography with a measurement device (2017-07-04),

12. 9235142 - Projection exposure system for microlithography and method of monitoring a lateral imaging stability (2016-01-12),

13. 9075321 - Optical membrane element having a longitudinally adjustable connecting element (2015-07-07),

14. 9001304 - Projection exposure system for microlithography with a measurement device (2015-04-07),

15. 8853642 - Beam regulating apparatus for an EUV illumination beam (2014-10-07),

Title: Inventor Ulrich Mueller

Introduction: Ulrich Mueller is a renowned inventor based in Aalen, Germany, known for his groundbreaking contributions to various technological fields.

Latest Patents: Ulrich Mueller holds several patents in the areas of renewable energy, sustainable materials, and advanced manufacturing processes.

Career Highlights: With a career spanning over two decades, Ulrich Mueller has worked for leading research institutions and companies, where he has spearheaded innovative projects resulting in significant technological advancements.

Collaborations: Throughout his career, Ulrich Mueller has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Ulrich Mueller's passion for innovation and his relentless pursuit of technological advancement continue to make him a key figure in the world of inventions and patents.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

4 patents pending: