The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2024
Filed:
Nov. 11, 2021
Carl Zeiss Smt Gmbh, Oberkochen, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
A method for generating a mathematical model (MM) for positioning individual mirrors (') of a facet mirror () in an optical system (), e.g. in a lithography apparatus (A,B). The method includes: a) providing (S) target positions (SP) of the individual mirrors (′) with an adjustment unit (), b) capturing (S) actual measurement positions (MI) of the individual mirrors (′) with a measuring device (), which is embodied as an interferometer, deflectometer and/or camera, and c) generating (S) a mathematical model (MM) for positioning the individual mirrors (′) based on the captured actual measurement positions (MI) and the target positions (SP). In step c), a difference (EA) is formed (S) between a respective actual measurement position (MI) and a respective target position (SP) and the mathematical model (MM) is generated (S) based on the difference (EA) formed.