The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2016
Filed:
Mar. 02, 2011
Michael Layh, Aalen, DE;
Ralf Stuetzle, Aalen, DE;
Damian Fiolka, Oberkochen, DE;
Martin Endres, Koenigsbronn, DE;
Holger Weigand, Oberkochen, DE;
Michael Layh, Aalen, DE;
Ralf Stuetzle, Aalen, DE;
Damian Fiolka, Oberkochen, DE;
Martin Endres, Koenigsbronn, DE;
Holger Weigand, Oberkochen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm. The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At least one optical modulation component of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.