The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2013
Filed:
Oct. 29, 2010
Damian Fiolka, Oberkochen, DE;
Berndt Warm, Schwaig, DE;
Christian Steigerwald, Heidenheim, DE;
Martin Endres, Koenigsbronn, DE;
Ralf Stuetzle, Aalen, DE;
Jens Ossmann, Aalen, DE;
Ralf Scharnweber, Aalen, DE;
Markus Hauf, Ulm, DE;
Udo Dinger, Oberkochen, DE;
Severin Waldis, Aalen, DE;
Marc Kirch, Aalen, DE;
Joachim Hartjes, Aalen, DE;
Damian Fiolka, Oberkochen, DE;
Berndt Warm, Schwaig, DE;
Christian Steigerwald, Heidenheim, DE;
Martin Endres, Koenigsbronn, DE;
Ralf Stuetzle, Aalen, DE;
Jens Ossmann, Aalen, DE;
Ralf Scharnweber, Aalen, DE;
Markus Hauf, Ulm, DE;
Udo Dinger, Oberkochen, DE;
Severin Waldis, Aalen, DE;
Marc Kirch, Aalen, DE;
Joachim Hartjes, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
Illumination optics for EUV microlithography guide an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1.