Company Filing History:
Years Active: 2009-2017
Title: Jens Ossmann: Innovator in Lithography Technology
Introduction
Jens Ossmann, a distinguished inventor based in Aalen, Germany, has made significant contributions to the field of lithography technology. With an impressive portfolio of 11 patents, his innovations have advanced the capabilities and precision of illumination systems utilized in semiconductor manufacturing processes.
Latest Patents
Among Ossmann's latest patents are the following innovative solutions:
1. **Illumination System for EUV Lithography**: This patent focuses on a sophisticated illumination system for extreme ultraviolet (EUV) lithography. The design includes a first optical element featuring multiple facet elements, which, upon receiving partial beams of radiation, generate secondary light sources. A second optical element complements this system with additional facet elements configured to interact with the primary elements, enhancing the efficiency of radiation usage in the lithography process.
2. **Catoptric Illumination System for Microlithography Tool**: This invention pertains to the illumination system used within microlithography tools. It comprises components designed to direct radiation along a specific optical path to an arc-shaped object field within the projection objective. Notably, at least one of the elements in the system has a uniquely curved design, differing from the standard arc shape, which enhances the overall imaging quality.
Career Highlights
Jens Ossmann has garnered valuable experience through his roles at reputable companies in the optics and lithography sector. He has worked with Carl Zeiss SMT GmbH and Carl Zeiss SMT AG, both of which are renowned for their innovations in imaging and optics technology. His contributions to these organizations have paved the way for advancements in lithography systems, pushing the boundaries of what is possible in high-precision manufacturing.
Collaborations
Throughout his career, Ossmann has collaborated with esteemed colleagues such as Martin Endres and Ralf Stuetzle. These partnerships have fostered an environment of innovation and idea exchange, leading to groundbreaking advancements in the field. Their shared expertise has enriched their work, promoting significant developments in lithography and optical technologies.
Conclusion
Jens Ossmann stands out as a pivotal figure in the realm of lithography technology, with a wealth of knowledge and an impressive array of patents under his belt. His work continues to influence the industry, providing essential innovations that enhance the productivity and precision of modern semiconductor manufacturing processes. As the field evolves, Ossmann's contributions will undoubtedly remain integral to future technological advancements.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.