Bopfingen, Germany

Eva Kalchbrenner


Average Co-Inventor Count = 12.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Schweiz, DE (2011)
  • Bopfingen, DE (2013)

Company Filing History:


Years Active: 2011-2013

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2 patents (USPTO):Explore Patents

Title: The Innovative Mind of Eva Kalchbrenner

Introduction

Eva Kalchbrenner is an accomplished inventor based in Bopfingen, Germany, known for her contributions to the field of optical integration in microlithographic projection exposure apparatus. With a total of two patents to her name, Eva has made significant strides in developing technologies that enhance illumination systems.

Latest Patents

Among her latest patents is an optical integrator specifically designed to produce multiple secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The patent also details a novel method for manufacturing an array of elongated microlenses utilized in such an illumination system. These arrays play a crucial role in the performance of optical integrators and scattering plates, contributing to the advancement of microlithography.

Career Highlights

Eva has worked with renowned companies such as Carl Zeiss SMT GmbH and Carl Zeiss SMT AG, where she has been instrumental in inspiring innovation and driving technological advancements. Her expertise lies in the field of optical engineering, particularly in the development of systems that improve illumination and image clarity in high-precision manufacturing processes.

Collaborations

Throughout her career, Eva has collaborated with esteemed colleagues, including Oliver Wolf and Heiko Siekmann. These collaborative efforts have further enhanced her research and development capabilities, enabling her to push the boundaries of existing technologies.

Conclusion

Eva Kalchbrenner stands out as a pioneering inventor whose work in optical integration significantly contributes to the advancements in microlithography. Her innovative patents and professional experience illustrate her commitment to enhancing technology in her field, establishing her as a key figure in the realm of optical engineering.

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