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For the Inventor, By the Inventor

Stuttgart, Germany

Timo Laufer

This inventor holds 20 USPTO granted patents and 1 published patent application and 7 EPO patents, primarily in EUV Lithography. Top assignees: Carl Zeiss Smt Gmbh, Asml Netherlands B.v., Carl-Zeiss-Smt Ag. Active years: 2008-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Timo Laufer. Retrieved from https://idiyas.com/inventor/timo-laufer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 20 

% Patents Active = 90.0

 

Average Co-Inventor Count = 3.1

ph-index = 3

Forward Citations = 27(Granted Patents)


Location History:

  • Aalen, DE (2008 - 2009)
  • Stuttgart, DE (2012 - 2022)

Company Filing History:

goldMedal17 out of 1,485 
 
Carl Zeiss Smt Gmbh
 patents
silverMedal5 out of 5,080 
 
Asml Netherlands B.v.
 patents
bronzeMedal3 out of 461 
 
Carl-Zeiss-Smt Ag
 patents
where one patent can have more than one assignee

Years Active: 2008-2025

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Areas of Expertise:
EUV Exposure Apparatus
Semiconductor Lithography
Temperature Control
Optical Elements
Thermal Robustness
Projection System
Reflective Elements
Optical Arrangement
Thermal Expansion
Projection Objective
Protection Module
20 patents (USPTO):Explore Patents
1. 12321106 - Device for detecting a temperature, installation for producing an optical element and method for producing an optical element (2025-06-03),
2. 12321105 - Projection exposure apparatus for semiconductor lithography (2025-06-03),
3. 12140877 - Method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatus (2024-11-12),
4. 11372341 - Method for temperature control of a component (2022-06-28),
5. 11187989 - Method for determining properties of an EUV source (2021-11-30),
6. 11022903 - Method for temperature control of a component (2021-06-01),
7. 10684551 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2020-06-16),
8. 10466598 - Projection exposure apparatus for semiconductor lithography with increased thermal robustness (2019-11-05),
9. 10317802 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2019-06-11),
10. 10031423 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2018-07-24),
11. 9746778 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2017-08-29),
12. 9639007 - Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus (2017-05-02),
13. 9383328 - Lithography apparatus (2016-07-05),
14. 9316929 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation (2016-04-19),
15. 9134504 - Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus (2015-09-15),

Title: The Innovative Journey of Inventor Timo Laufer

Introduction:

In the realm of innovation and patenting, inventor Timo Laufer has left a remarkable legacy with his numerous patents and contributions. Hailing from Stuttgart, Germany, Laufer has made significant strides in the field of temperature control and properties determination in various systems.

Latest Patents:

Timo Laufer's latest patents showcase his ingenuity and expertise in the field:

1. Method for temperature control of a component: This method involves controlling the temperature drift of a component when transferred between different systems, ensuring optimal performance and reduced temperature variations.

2. Method for determining properties of an EUV source: Laufer's innovation revolves around determining essential properties of an EUV source in semiconductor lithography, enhancing the efficiency of projection exposure apparatus.

Career Highlights:

Laufer has amassed a total of 17 patents, solidifying his position as a pioneering inventor in the industry. With a keen focus on temperature control and properties determination, his inventions have paved the way for advancements in various technological applications.

Collaborations:

Throughout his career, Timo Laufer has collaborated with esteemed companies such as Carl Zeiss SMT GmbH and ASML Netherlands B.V. His partnerships with coworkers like Markus Hauf and Norman Baer have further enriched his innovative pursuits, leading to groundbreaking developments in the field.

Conclusion:

Inventor Timo Laufer's relentless dedication to innovation and patenting has reshaped the landscape of temperature control and properties determination. His remarkable achievements stand as a testament to his ingenuity and unwavering commitment to advancing technological frontiers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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