The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2016
Filed:
Aug. 15, 2013
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventor:
Timo Laufer, Stuttgart, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 25/16 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G01N 25/16 (2013.01); G03F 7/7085 (2013.01); G03F 7/70825 (2013.01); G03F 7/70858 (2013.01);
Abstract
A lithography apparatus comprises a structural element, a sensor having a detection region for detecting a physical quantity in at least one detection direction with respect to the structural element, and a sensor receptacle for mounting the sensor to the structural element, wherein the sensor is arranged in such a way that the maximum displacement of the detection region in the detection direction relative to the structural element is not greater than the maximum displacement of the detection region in the detection direction in the case of an arrangement of the sensor orthogonally with respect thereto.