Average Co-Inventor Count = 3.06
ph-index = 3
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. Carl Zeiss Smt Gmbh (17 from 1,409 patents)
2. Asml Netherlands B.v. (5 from 4,892 patents)
3. Carl-zeiss-smt Ag (3 from 461 patents)
20 patents:
1. 12321106 - Device for detecting a temperature, installation for producing an optical element and method for producing an optical element
2. 12321105 - Projection exposure apparatus for semiconductor lithography
3. 12140877 - Method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatus
4. 11372341 - Method for temperature control of a component
5. 11187989 - Method for determining properties of an EUV source
6. 11022903 - Method for temperature control of a component
7. 10684551 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation
8. 10466598 - Projection exposure apparatus for semiconductor lithography with increased thermal robustness
9. 10317802 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation
10. 10031423 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation
11. 9746778 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation
12. 9639007 - Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus
13. 9383328 - Lithography apparatus
14. 9316929 - EUV exposure apparatus with reflective elements having reduced influence of temperature variation
15. 9134504 - Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus