The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2016
Filed:
Nov. 20, 2012
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Albrecht Ehrmann, Aalen, DE;
Ulrich Wegmann, Koenigsbronn, DE;
Rainer Hoch, Aalen, DE;
Joerg Mallmann, Boppard, DE;
Karl-Heinz Schuster, Koenigsbronn, DE;
Ulrich Loering, Schwaebisch Gmuend, DE;
Toralf Gruner, Aalen-Hofen, DE;
Bernhard Kneer, Altheim, DE;
Bernhard Geuppert, Aalen, DE;
Franz Sorg, Aalen, DE;
Jens Kugler, Aalen, DE;
Norbert Wabra, Werneck, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.